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Cleaning machine×大川興産 - メーカー・企業と製品の一覧

Cleaning machineの製品一覧

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e-Clean 2-liquid 1-tank degreasing cleaning device (HC solvent + HFE solvent)

e-Clean 2-liquid 1-tank degreasing cleaning device (HC solvent + HFE solvent)

A space-saving, low running cost, and low-priced ultrasonic cleaning device that achieves safe and easy cleaning and drying. Patent pending.

Cleaning with hydrocarbon (HC) based cleaning solvent ⇒ Rinsing with HFE solvent vapor ⇒ Recovery of fast-drying HFE solvent in the drying process (end of drying and cleaning) ⇒ Removal During cleaning, HC solvent is covered by HFE vapor and does not come into direct contact with air, eliminating the risk of ignition. The boiling point of the HFE solvent used in the rinsing process is 56°C, and the surface temperature of the items being cleaned does not rise above 56°C. Handling of the products after cleaning becomes very easy. All solvents used in this device can be recovered and reused (optional). Sales will begin for two models: Type 300 and Type 600. The dimensions of each cleaning fixture are 200mm × 300mm × 200mm H and 290mm × 350mm × 250mm H, respectively.

  • Ultrasonic Cleaner
  • Other semiconductor manufacturing equipment
  • Other environmental equipment

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Cleaning device "Organic EL Mask Cleaning Device"

Cleaning device "Organic EL Mask Cleaning Device"

Achieving environmentally friendly low emissions and low running costs.

The OEL-Clean series, highly regarded for its cleaning power, allows for the precise control of organic materials deposited on metal masks through its use and the many know-how associated with it, achieving a quality equivalent to that of new masks. It maximizes safety, security, environmental considerations, cleaning precision, cost-effectiveness, and productivity. The use of non-flammable solvent HFE for rinsing and drying ensures safety. The HFE solvent is also rejuvenated into a new liquid through distillation and HC/HFE separation devices, allowing for reuse. 【Features】 ○ Thin film masks are vulnerable to thermal stress, which is mitigated by washing at room temperature to eliminate thermal stress. ○ With the incorporation of a distillation unit, the cleaning solution is rejuvenated into a new liquid, and contaminants are condensed and discharged as a small amount of waste liquid, eliminating the need for traditional complete liquid replacement. ○ A cleaning device for organic EL glass substrates has also been developed. For more details, please contact us or download the catalog.

  • Other cleaning machines

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Degreasing cleaning machine (co-solvent method)

Degreasing cleaning machine (co-solvent method)

Always regenerate and reuse cleaning solvents! A cleaning machine that achieves high cleaning precision and reduces solvent consumption.

The co-solvent method involves cleaning and drying using two types of cleaning solvents. It is a cleaning system that cleans with hydrocarbon-based cleaning solvents (HC solvents) and rinses and dries with HFE/HFC solvents (rinsing solvents). The dirt dissolved in the HC solvent is distilled and regenerated using an HC vacuum distillation machine and is discharged outside the equipment. The HC solvent brought into the rinsing solvent goes through a solvent separation device, and the HC solvent and rinsing solvent are returned to their respective cleaning tanks for reuse. By cleaning with HC solvents that have high surface tension and rinsing and drying with rinsing solvents that have low surface tension, high cleaning precision can be expected. Since the items being cleaned are not exposed to high temperatures, they are also easy to handle. [For more details, please download the catalog or feel free to contact us.]

  • Ultrasonic Cleaner
  • Other semiconductor manufacturing equipment
  • Other environmental equipment

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Organic solvent-compatible cleaning machine

Organic solvent-compatible cleaning machine

With many years of experience and a proven track record, we can offer suggestions for reducing the running costs of solvent cleaning machines.

◆ We offer customized cleaning machines that meet your specifications, ranging from manual to automatic organic solvent cleaning machines. ◆ Compatible with basket cleaning machines and inline cleaning machines. ◆ Cleaning experiments are also possible. ◆ Compatible solvents: 【Chlorinated organic solvents】 - Methylene chloride (dichloromethane) Methylene chloride, Metaclean, etc. - AK-225 (HCFC-225) 【Inert organic solvents】 - HFE (hydrofluoroether) - HFC (hydrofluorocarbon)

  • Engine parts

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Chlorine-based solvent compatible cleaning machine

Chlorine-based solvent compatible cleaning machine

With many years of experience and a proven track record, we can offer suggestions for reducing the running costs of chlorine-based solvent cleaning machines.

◆ Chlorinated solvent cleaning machines can be customized to propose cleaning machines that meet your specifications, from manual to automatic models. ◆ We can accommodate basket cleaning machines and inline cleaning machines. ◆ Cleaning experiments are also possible. ◆ Compatible solvents 【Chlorinated organic solvents】 - Methylene chloride (dichloromethane) Methylene chloride, Metaclean, etc. - AK-225 (HCFC-225)

  • Engine parts

ブックマークに追加いたしました

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ブックマークを削除いたしました

ブックマーク一覧

これ以上ブックマークできません

会員登録すると、ブックマークできる件数が増えて、ラベルをつけて整理することもできます

無料会員登録
e-Clean 2-liquid 1-tank degreasing cleaning machine (HC solvent + HFE solvent)

e-Clean 2-liquid 1-tank degreasing cleaning machine (HC solvent + HFE solvent)

Space-saving, low running cost, and low-priced ultrasonic cleaner! Achieves safe and easy drying.

Cleaning with hydrocarbon (HC) cleaning solvents ⇒ Rinsing with HFE solvent vapor ⇒ Collecting fast-drying HFE solvent in the drying process (end of drying and cleaning) ⇒ Removal. During cleaning, HC solvents are covered by HFE vapor and do not come into direct contact with air, eliminating the risk of ignition. The boiling point of the HFE solvent used in the rinsing process is 56°C, and the surface temperature of the items being cleaned does not rise above 56°C. Handling of the products after cleaning becomes very easy. All solvents used in this device can be recovered and reused (optional). Sales will begin for two models: the 300 type and the 600 type. The dimensions of each cleaning fixture are 200mm × 300mm × 200mmH and 290mm × 350mm × 250mmH, respectively.

  • Ultrasonic Cleaner
  • Other semiconductor manufacturing equipment
  • Other environmental equipment

ブックマークに追加いたしました

ブックマーク一覧

ブックマークを削除いたしました

ブックマーク一覧

これ以上ブックマークできません

会員登録すると、ブックマークできる件数が増えて、ラベルをつけて整理することもできます

無料会員登録
Degreasing Cleaning Machine (Co-solvent Method) [Significant reduction in solvent consumption!]

Degreasing Cleaning Machine (Co-solvent Method) [Significant reduction in solvent consumption!]

Significant reduction in solvent consumption! A cleaning machine that constantly regenerates and reuses cleaning solvents through distillation/separation.

The "Degreasing Cleaning Machine (Co-solvent Method)" by Okawa Kousan uses two types of cleaning solvents for cleaning and drying, allowing for powerful drying performance and enabling the selection of solvents with a focus on safety. Additionally, the cleaning solvent is returned to the cleaning tank and reused through a distillation device and a separation device. 【Features】 ◆ By regenerating and reusing the cleaning solvent, solvent consumption is drastically reduced ◆ Excellent drying performance allows for a focus on safety when selecting solvents ◆ Since the items being cleaned are not exposed to high temperatures, handling is easy 【For more details, please download the catalog or feel free to contact us】

  • Ultrasonic Cleaner
  • Other semiconductor manufacturing equipment
  • Other environmental equipment

ブックマークに追加いたしました

ブックマーク一覧

ブックマークを削除いたしました

ブックマーク一覧

これ以上ブックマークできません

会員登録すると、ブックマークできる件数が増えて、ラベルをつけて整理することもできます

無料会員登録
Cleaning machine "Organic EL Mask Cleaning Device"

Cleaning machine "Organic EL Mask Cleaning Device"

An environmentally friendly cleaning machine that achieves low emissions and low running costs.

The OEL-Clean series, highly regarded for its cleaning power, allows for the precise control of organic materials deposited on metal masks through its use and the extensive know-how that accompanies it, achieving a quality that is indistinguishable from a new mask. It maximizes safety, security, environmental considerations, cleaning precision, cost-effectiveness, and productivity. The use of non-flammable solvent HFE for rinsing and drying ensures safety. The HFE solvent is also rejuvenated into new liquid through distillation and HC/HFE separation equipment, allowing for reuse. 【Features】 - Thin film masks are sensitive to thermal stress, and this is addressed by washing at room temperature to eliminate thermal stress. - With the incorporation of a distillation unit, the cleaning solution is rejuvenated into new liquid, and contaminants are condensed and discharged as a small amount of waste liquid, eliminating the need for traditional full liquid replacement. - A cleaning machine for organic EL glass substrates has also been developed. For more details, please contact us or download the catalog.

  • Other cleaning machines

ブックマークに追加いたしました

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ブックマークを削除いたしました

ブックマーク一覧

これ以上ブックマークできません

会員登録すると、ブックマークできる件数が増えて、ラベルをつけて整理することもできます

無料会員登録
Degreasing cleaning machine (co-solvent method) [Significant reduction in solvent consumption!]

Degreasing cleaning machine (co-solvent method) [Significant reduction in solvent consumption!]

Reduce solvent consumption and drastically cut running costs! This cleaning machine continuously regenerates and reuses cleaning solvents through distillation and separation.

The "De-greasing Cleaning Machine (Co-solvent Method)" by Okawa Kousan uses two types of cleaning solvents for cleaning and drying, achieving powerful drying performance, allowing for solvent selection with a focus on safety. Additionally, the cleaning solvent is returned to the cleaning tank and reused through the distillation and separation devices. 【Features】 ◆ By regenerating and reusing the cleaning solvent, solvent consumption is greatly reduced ◆ Excellent drying performance allows for a focus on safety during solvent selection ◆ Since the items being cleaned are not exposed to high temperatures, handling is easy 【For more details, please download the catalog or feel free to contact us】

  • Ultrasonic Cleaner
  • Other semiconductor manufacturing equipment
  • Other environmental equipment

ブックマークに追加いたしました

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ブックマークを削除いたしました

ブックマーク一覧

これ以上ブックマークできません

会員登録すると、ブックマークできる件数が増えて、ラベルをつけて整理することもできます

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